Page 374 - Zur Reinheit funktionaler Oberflächen

Siegerman H., Lyon B., Spivey A. „ Feuchte Wischtücher für
den Reinraum - Fortschritte beim Reinheitsniveau“, ReinRaum-
Technik 1/2006, GIT-Verlag, Darmstadt
Siegmann, Sven, Textor, Torsten - „Prüfmethode CC-W-RF-
99, Bestimmung des Flüssigkeits-Rückstands nach Siegmann,
Textor“, Clear & Clean Publikation, 1999, Lübeck
Skrivanek, Thomas „Oberflächenreinheit gemessen in einer
Sekunde“, Vortrag auf der parts2clean, 02.06.2016, Stuttgart
Slade, Philip E., Hild, Dabra N. „Surface Energies of Nonionic
Surfactants Adsorbed onto Nylon Fiber and a Correlation with
Their Solubility Parameters“, Textile Research Journal, Sep-
tember 1992, Vol. 62
Slowers, Irving F. „Advances in cleaning metal and glass sur-
faces to micron-level cleanliness“, Journal of Vacuum Science
and Technology 15, 751 (1978)
Smith, D. L., Gillanders, S., Holah, J. T., Gush, C. „Assessing
the efficacy of different microfiber cloths at removing surface
micro-organisms associated with healthcare-associated infec-
tions“, Journal of Hospital Infection, Vol. 78, Issue 3, July
2011, pp. 182-18
Soll, Michael, Peters, Wibke, Gerhards, Petra „Pyrolyse für die
Werkstoffanalyse - die Kopplung an GCMS“, GIT Labor-Fach-
zeitschrift 7/2017, Wiley-VCH Verlag, Weinheim
Sorensen, Robert L. „Contamination Control in Pharmaceuti-
cal Manufacturing“, Proceedings, Institute of Environmental
Sciences, 1986
Soules, William J. „Testing Wipers for Abrasion Resistance“,
9th ICCCS Proceedings 1988, Institute of Environmental
Sciences
Sovinski, Marjorie F. „Contamination of Critical Surfaces from
NVR Glove Residues Via Dry Handling and Solvent Cleaning“,
NASA Technical Reports, April 2004
Sovinski, Marjorie F. „Non-Volatile Residue (NVR) Contami-
nation from Dry Handling and Solvent Cleaning“, Materials
Engineering Branch, Code 541, July 23, 2009
Steigmeier, E. F., Auderset, H. „Light Scattering Topogra-
phy and Photoluminescence Topography“, Applied Physics A,
Springer-Verlag, 1990
Steinman, Arnold „Ionisation - Static charge: wafer fab conta-
minant“, Cleanroom Technology, Autumn 1995
Steinman, Arnold „Electrostatic charge: a contamination
control challenge“, European Semiconductor, February 1994
Steinman, Arnold, Montoya, Julian A. „Cleanroom Technolo-
gies - Developing an exit charge specification for semiconduc-
tor production equipment“, Micro Magazine, April 1997
Stellmack, Mary „Microanalytical Techniques for Identifying
Nonprotein Contaminants in Biologics“, BioProcess Internatio-
nal, February 2010

374